COPRA, PECVD, Plasma Source | CCR Technology

CCR-Technology product line

COPRA Round Sources

COPRA Round Sources

Wafer processing up to 12“ substrates Plasma Assist in PVD Coaters
Plasma Activation and Cleaning ALD enhancement

COPRA Linear Sources

COPRA Linear Sources

Roll-To-Roll „Web“ Processing Dynamic PECVD on Flexible Substrates
PVD Assist and PECVD in Batch Processing

 

 

 

COPRA Ring Sources

COPRA Ring Sources

Flat Panel PECVD up to Generation 5 Dynamic PECVD on Large Substrates
PVD Assist and PECVD in Batch Processing

COPRA Built-In Sources

COPRA Built-In Sources

E-Gun Assist „Web“ Processing
Direct DLC in optics (Inside chamber mounting)

COPRA Plasma Systems

COPRA Plasma Systems

In-Line or Batch
PECVD coaters for metal-oxide/nitride functional coatings

Faraday Cup

Faraday Cup

The CCR Faraday Cup CEA4 Plasma Monitoring System enables precise measurement of plasma parameters such as Ion Energy Distribution IED, Ion Energy, Ion Current Density and Ion Energy vs Time. Find the best operational  parameters for your existing and in particular new coater design and processes in order to ensure highest performance of your system.